Document Type : Research Paper

Authors

1 Science College - University of Al-Anbar

2 Science College - University of Baghdad

Abstract

Gallium arsenide undoped and doped thin films with 5% Indium and thick of 500 nm by flash evaporative technology on glass substrate and silicon wafers at room temperature at 10-2 mbar pressure with deposition rate of 9.25Å/s. These films were annealed at (373 and 473) K for one hour. The images of the atomic force microscopy of the films deposited on glass substrates showed that the rate of surface roughness increased at the temperature of (373)K while it was reduced at (473)K. It was also observed that the average grain size increased with the increasing in the annealing temperature. The electrical properties showed that the prepared films had an electrical conductivity of 2.05×10-3(Ω.cm)-1and that the annealing led to a decrease in the values of the electrical conductivity while there was an increase in the values of the mobility by increasing the temperature of annealing. A study of Hall's effect showed that all the prepared films have a positive type (p-type) and that the concentration of charge carriers (nH) decreased by increasing the annealing temperature and Hall's mobility (µH) increased by increasing the annealing temperature. The voltage of the open circuit (Voc) increases with the increase in the temperature of the alternation due to the increase of the short circuit current Isc. The value of the FF and the efficiency of the solar cell (η) increases with the increase of the temperature of the intercellular hybrid.

Keywords

Main Subjects

[1] G. Margaritondo,"Electronic Structure of semiconductor Heterojunctions", Springer-Verlag, Berlin Heidelberg, London, (1988).
[2] B. L. Sharma and R. K. Purohit, "Semiconductor Heterojunctions", 1st Edition. Pergamon Press Ltd, New York, (1974).
[3] Sayantan B.,Ashim K., Avigyan C. ,and Amitabha S., "An Analytical Study of a GaAs-Si np Heterojunction Solar Cell and Suggestion for A Structre for Improved performance"., International Journal of Applied Engineering Research, Vo1,  No3, P (1855-1858),(2016).
[4] L. A. Kosyachenko, "Solar Cells–Thin–Film Technologies", Publisher In Tech, Campus University Campus - Croatia, (2011).
[5] R. S. Quimby, "Photonics and Lasers-An Introduction", John Wiley & Sons, Inc., Hoboken, New Jersey, (2006).
[6] Hussein Kh. Rasheed, Dhuhaimad ''Effect of Annealing Temperature on Structral and Electrical properties of a-GaAs:Se Films" International Journal of Applied Electrical and Electrical and Electrones Engineering,V01-1 p (138-142) (2015 ).
[7] I. Vuraftman, J.R. Meyer and L.R.Ram. Mohan, "Band parameters for III–V compound semiconductors and their alloys" Journal of Applied Physics, Vol.89, No.11, p. 5815-5875  (2001).
[8] Husain Kh., DuhahImad, " Surface Morphology and Photoluminescences properties of    A-GaAs:Se Detector", International J. of Sc.&Tec. Research, 4, 01, p.p229-231, (2015).
[9] M. G. Yousif, "Solid State Physics", 2nd Edition, Baghdad University, Arabic version, (1989).
[10] D. Shaw, "Atomic Diffusion in Semiconductors", Plenum Publishing Ltd, New York, (1973).
[11] L. Kazmerski, "Polycrystalline and Amorphous Thin Films and Devices", Academic Press, New York, (1980).
[12] B. G. Yacobi, "Semiconductor Materials: An Introduction to Basic Principles", Springer-Verlag, Berlin Heidelberg, (2003).
[13] A. G. Nilens, "Deep Impurity in Semiconductors", Wiley-Inter Science Publication, Canada, (1973).
[14] M. N. Islam and S. K. Mitra, "Electrical and optical properties of annealed gallium arsenide thin films on glass substrates" Journal of Materials Science, Vol.24, pp.2863-2865 (1986).
[15] P. Extance, S. R. Elliott, and E.A. Davis “Frequency-dependent conductivity in sputtered amorphous phosphorus thin films”, Journal Physical Review B, vol.35, P. 8148, (1985).
[16] Hussein Kh. Rasheed, Dhuhaimad ''Effect of Annealing Temperature on structral and Electrical properties of a-GaAs:se Films '' International Journal of Applied Electrical and Electrical and Electrons Engineering, V01-1 p.p138-142, (2015).
[17] G. Gomila and J. M. rubi, "Relation for the nonequilibrium population of the interface states: Effects on the bias dependence of the ideality factor" J. appl. Phys. , V.81, P.2679, (1996).
[18] Mahdi H. Suhail, Souad G. Kaleel and Marwa R. Fahad, "Influence of thickness and annealing temperature on structural and electrical properties of Te/Si heterojunction" Int. J. Thin Film Sci. Tec. ,V. 1 No. 1, P. 09-23, (2012).
[19] M. A. El-Wahhab "Schottky Diode of In/GaAs/Au-Ag Films Prepared by Flash Evaporation", M.Sc., University of Baghdad (2006).
[20] S.M.Sze,“semiconductor Devices ,Physics and Technology”, Wiley ,New York.(1985).
[21] B.L. Sharma and R.K. Purohit, “Semiconductor Heterojunctions”. Pergamon Press, NewYork, 1974.
[22] K. W. Boer, "Survey of Semiconductor Physics: Barriers, Junctions, Surfaces and Devices" Vo.2, Van Nostrand Reinhold Press, Canada, (1992).
[23] S. M. Sze, "Physics of Semiconductor Devices", 3rd Edition. John Wiley and Sons, Inc Publication, Canada, (2007).