Document Type : Research Paper

Authors

1 University of Technology - department of Applied physics

2 University of Technology - Electro engineering

Abstract

In the present work, bismuth oxide Nanostructure thin film was prepared using reactive pulse laser deposition method. Optical, structural and surface morphology properties was carried out and the result insure the formation of polycrystalline Bi2O3 thin film with energy gap of (2.5) eV .The Atomic Force Microscopic Image show a Nano crystalline structure with average grain size of about (75.42 nm) .

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Main Subjects

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